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Microchannels: High‐Aspect‐Ratio Parallel‐Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition (Adv. Mater. Interfaces 16/2016)
Author(s) -
Shima Kohei,
Funato Yuichi,
Sugiura Hidetoshi,
Sato Noboru,
Fukushima Yasuyuki,
Momose Takeshi,
Shimogaki Yukihiro
Publication year - 2016
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201670080
Subject(s) - microchannel , materials science , microchannel plate detector , chemical vapor deposition , aspect ratio (aeronautics) , deposition (geology) , kinetic energy , nanotechnology , chemical engineering , analytical chemistry (journal) , composite material , optics , chromatography , chemistry , paleontology , physics , engineering , quantum mechanics , sediment , biology , detector
Kohei Shima and co‐workers develop a very deep microchannel with aspect ratio ≥ 1000:1 as a test structure for kinetic analysis and process development of chemical vapor deposition (CVD) in article 1600254. When CVD is conducted into the microchannel, the sticking probability of film‐forming species can be detected in the range from 1 down to the order of 10 −7 , by analyzing the film‐thickness gradient.