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Wafer‐Scale Selective‐Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates
Author(s) -
Dandley Erinn C.,
Lemaire Paul C.,
Zhu Zhongwei,
Yoon Alex,
Sheet Lubab,
Parsons Gregory N.
Publication year - 2017
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201601178
Subject(s) - materials science , photoresist , isopropyl alcohol , nanolithography , poly(methyl methacrylate) , polymer , lithography , methyl methacrylate , resist , wafer , nanotechnology , optoelectronics , polymerization , chemical engineering , composite material , fabrication , layer (electronics) , engineering , medicine , alternative medicine , pathology
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