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Insight into CO 2 Etching Behavior for Efficiently Nanosizing Graphene
Author(s) -
Yang Xue,
Hu Baoshan,
Jin Yan,
Zhao Wenbin,
Luo Zhengtang,
Lu Zhisong,
Fang Liang,
Ruan Haibo
Publication year - 2017
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201601065
Subject(s) - graphene , materials science , etching (microfabrication) , nanotechnology , isotropic etching , chemical vapor deposition , crystallinity , graphene nanoribbons , fabrication , chemical engineering , layer (electronics) , composite material , medicine , alternative medicine , pathology , engineering
Chemical etching of graphene over catalytic metal surface holds great potential in nanosizing the graphene microstructure and thus modulating its properties. Herein, it has been demonstrated that gaseous CO 2 can efficiently etch the monolayer graphene film grown by chemical vapor deposition catalyzed with the surface of Cu foil. During the etching process, the CO 2 etching rate is monotonously dependent on the CO 2 flowrate and the etching temperature, and is faster than the H 2 etching which has been usually employed for the graphene patterning. Moreover, the resultant graphene flakes by the CO 2 etching remain the originally high crystallinity and are free of being oxidized. Also, a 120° angle between the neighboring edges and hexagonal morphology of graphene flakes can be realized for the potential shape regulation of nanostructured graphene, which is similar as the anisotropic etching of H 2 . These results illustrate that the CO 2 etching over the metal surface can provide a promising strategy for the precisely fabrication of nanostructured graphene materials.