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Atomic Layer Deposition for Sensitized Solar Cells: Recent Progress and Prospects
Author(s) -
Kim Do Han,
Losego Mark D.,
Peng Qing,
Parsons Gregory N.
Publication year - 2016
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201600354
Subject(s) - atomic layer deposition , materials science , nanotechnology , deposition (geology) , layer (electronics) , dye sensitized solar cell , chemistry , paleontology , electrode , sediment , electrolyte , biology
Atomic layer deposition (ALD) and molecular layer deposition (MLD) are vapor phase deposition techniques used to create conformal coatings with molecular‐level control of thickness and composition. Recently, ALD and MLD have been extensively exploited to engineer the complex interfaces of dye‐sensitized solar cells (DSSCs) and other molecularly functionalized photoelectrochemical devices to improve the performance and long‐term stability. This progress report describes the recent advances in the applications of ALD and MLD for sensitized solar cells including DSSCs then discusses current challenges and future opportunities of ALD.