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Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
Author(s) -
Park Suk Won,
Bae Kiho,
Kim Jun Woo,
Lee Gyeong Beom,
Choi ByoungHo,
Lee Min Hwan,
Shim Joon Hyung
Publication year - 2016
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201600340
Subject(s) - atomic layer deposition , polycarbonate , materials science , chemisorption , layer (electronics) , acetone , chemical engineering , etching (microfabrication) , surface modification , transmittance , plasma , plasma etching , nanotechnology , catalysis , composite material , organic chemistry , chemistry , engineering , physics , optoelectronics , quantum mechanics
This study reports the effect of an O 2 plasma pretreatment of polycarbonate (PC) films for the enhanced integration of Al 2 O 3 films prepared by atomic layer deposition (ALD) on the PC substrate. It is revealed that the plasma treatment produces functional groups on the PC surface, which are essential for the ALD of Al 2 O 3 . Specifically, it is revealed that a significant amount of carbonyl groups, essential for the chemisorption of the precursors and covalent binding with the Al 2 O 3 surface protection layer, are present in the plasma‐treated PC surface. To evaluate the chemical resistivity of the PC‐ALD alumina film, an acetone immersion test is conducted. As a result, a severe degradation occurs in the plasma‐untreated PCs, even with a sufficiently thick ALD alumina protection layer. In contrast, the PCs that are plasma‐treated and coated with the ALD alumina exhibit a significantly improved stability against acetone etching. Light transmittance and surface morphology analysis support this improvement.