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Fabrication of MoS 2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers
Author(s) -
Chaudhari Atul,
Ghoshal Tandra,
Shaw Matthew T.,
O'Connell John,
Kelly Roisin A.,
Glynn Colm,
O'Dwyer Colm,
Holmes Justin D.,
Morris Michael A.
Publication year - 2016
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201500596
Subject(s) - materials science , molybdenum disulfide , nanotechnology , nanowire , copolymer , template , fabrication , chemical vapor deposition , annealing (glass) , self assembly , nanostructure , molybdenum , optoelectronics , chemical engineering , polymer , composite material , medicine , alternative medicine , pathology , engineering , metallurgy
The electronics industry is beginning to show interest in 2D molybdenum disulfide (2D‐MoS 2 ) as a potential device material due to its low band gap and high mobility. However, current methods for its synthesis are not “fab” friendly and require harsh environments and processes. Here, a novel method to prepare MoS 2 nanowire arrays and layered structures via self‐assembly of a block copolymer system is reported. Well‐controlled films of microphase separated line‐space nanopatterns have been achieved by solvent annealing process. The self‐assembled films are used as “templates” for the generation of nonstoichometric molybdenum oxide by in situ inclusion technique following UV/Ozone treatment. Well‐ordered array of MoS 2 and a layered structure are then prepared by chemical vapor deposition using sulfur powder at lower temperature. The surface morphology, crystal structure, and phases are examined by different microscopic and spectroscopic techniques. This strategy can be extended to several other 2D materials systems and open the pathway toward better optoelectronic and nanoelectromechanical systems.