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Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers
Author(s) -
Inoue Takejiro,
Janes Dustin W.,
Ren Jiaxing,
Suh Hyo Seon,
Chen Xuanxuan,
Ellison Christopher J.,
Nealey Paul F.
Publication year - 2015
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201500133
Subject(s) - copolymer , materials science , transfer printing , conformal map , nanotechnology , composite material , polymer , geometry , mathematics
Areal defect frequency in patterns formed by the directed self‐assembly of block copolymers can likely be minimized by using 1:1 chemical nanopatterns. Here, a transfer printing technique is demonstrated by using conformal layers that generates continuous, sub‐15 nm resolution, 1:1 chemical nanopatterns over large areas.