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Quantitative Nanometer‐Scale Mapping of Dielectric Tunability
Author(s) -
Tselev Alexander,
Klein Andreas,
Gassmann Jürgen,
Jesse Stephen,
Li Qian,
Kalinin Sergei V.,
Balke Nina
Publication year - 2015
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201500088
Subject(s) - materials science , dielectric , nanometre , image resolution , piezoresponse force microscopy , microwave , microscopy , near field scanning optical microscope , resolution (logic) , scanning probe microscopy , optoelectronics , optics , ferroelectricity , optical microscope , scanning electron microscope , telecommunications , physics , composite material , artificial intelligence , computer science
Two scanning probe microscopy techniques—near‐field scanning microwave microscopy (SMM) and piezoresponse force microscopy (PFM)—are used to characterize and image tunability in a thin (Ba,Sr)TiO 3 film with nanometer scale spatial resolution. While sMIM allows direct probing of tunability by measurement of the change in the dielectric constant, in PFM, tunability can be extracted via electrostrictive response. The near‐field microwave imaging and PFM provide similar information about dielectric tunability with PFM capable to deliver quantitative information on tunability with a higher spatial resolution close to 15 nm. This is the first time, information about the dielectric tunability is available on such length scales.