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Nanolithography: Manufacturing Over Many Scales: High Fidelity Macroscale Coverage of Nanoporous Metal Arrays via Lift‐off‐Free Nanofabrication (Adv. Mater. Interfaces 7/2014)
Author(s) -
Altun Ali Ozhan,
Bond Tiziana,
Park Hyung Gyu
Publication year - 2014
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201470041
Subject(s) - nanolithography , materials science , nanoporous , nanotechnology , nanometre , lithography , nanoscopic scale , dip pen nanolithography , fabrication , optoelectronics , composite material , medicine , alternative medicine , pathology
Macroscale patterning of nanometer‐scale features by single‐step nanolithography can embody a concept of “manufacturing over many length scales.” A simple blend between block copolymer nanolithography and collimated ion beam milling creates homogeneous nanoporous arrays of metal over a ten‐centimeter wafer scale, for which sub‐nanometer‐level smoothness of the metal film is critical as revealed by T. Bond, H. G. Park, and co‐workers in article 1400084.

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