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Direct Release of Sombrero‐Shaped Magnetite Nanoparticles via Nanoimprint Lithography
Author(s) -
Kwon Byung Seok,
Zhang Wei,
Li Zheng,
Krishnan Kannan M.
Publication year - 2015
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201400511
Subject(s) - materials science , nanoimprint lithography , fabrication , nanotechnology , sputter deposition , nanoparticle , bilayer , sputtering , thin film , membrane , biology , genetics , medicine , alternative medicine , pathology
Magnetic nanoparticles produced via nanoimprint lithography can change the current paradigm of fabrication processes from chemical “bottom‐up” synthesis to “top‐down” fabrication. The combination of controlled nondirectional magnetron sputtering, ETFE mold, bilayer lift‐off, and dry etching release can control the shape, size, and structure of the fabricated nanoparticles. The resulting magnetic nanoparticles have a novel “sombrero” shape with complex and unique physical/magnetic properties.