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Manufacturing Over Many Scales: High Fidelity Macroscale Coverage of Nanoporous Metal Arrays via Lift‐Off‐Free Nanofabrication
Author(s) -
Altun Ali Ozhan,
Bond Tiziana,
Park Hyung Gyu
Publication year - 2014
Publication title -
advanced materials interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.671
H-Index - 65
ISSN - 2196-7350
DOI - 10.1002/admi.201400084
Subject(s) - materials science , nanolithography , nanotechnology , nanoporous , wafer , nanoscopic scale , thin film , polystyrene , fabrication , polymer , composite material , medicine , alternative medicine , pathology
A low‐cost, high‐throughput, lift‐off‐free nanolithographic method is developed for creating hexagonal arrays of sub‐30‐nm‐sized pores on a metal film, achieving uniform coverage over an entire wafer of 10 cm in diameter. Spherical nanodomains of poly(methyl methacrylate) are demonstrated to be well‐controlled and self‐aligned within a polystyrene matrix layer on a metal thin film without any intermediary coating. After removal of PMMA, the porous PS thin film acts as an etch mask for defining nanoscale pores in the metal underlayer by Ar ion beam milling, resulting in wafer‐scale patterning with great fidelity.