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Additive Manufacturing: Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing (Adv. Mater. 47/2020)
Author(s) -
Cook Caitlyn C.,
Fong Erika J.,
Schwartz Johanna J.,
Porcincula Dominique H.,
Kaczmarek Allison C.,
Oakdale James S.,
Moran Bryan D.,
Champley Kyle M.,
Rackson Charles M.,
Muralidharan Archish,
McLeod Robert R.,
Shusteff Maxim
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.202070355
Subject(s) - materials science , photopolymer , thiol , polymerization , ene reaction , 3d printing , layer (electronics) , composite material , nanotechnology , chemical engineering , polymer , organic chemistry , chemistry , engineering
Volumetric additive manufacturing (VAM) is an emerging approach for photopolymer‐based 3D printing that produces complex 3D structures in a single step, rather than from layer‐by‐layer assembly. In article number 2003376, Maxim Shusteff and co‐workers adapt thiol‐ene resins for VAM by incorporating a threshold response using a polymerization inhibitor. Due do the uniform thiol‐ene network formation, a broad range of mechanical properties can be accessed.