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Effect of Adventitious Carbon on Pit Formation of Monolayer MoS 2
Author(s) -
Park Sangwook,
Siahrostami Samira,
Park Joonsuk,
Mostaghimi Amir Hassan Bagherzadeh,
Kim Taeho Roy,
Vallez Lauren,
Gill Thomas Mark,
Park Woosung,
Goodson Kenneth E.,
Sinclair Robert,
Zheng Xiaolin
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.202003020
Subject(s) - monolayer , molybdenum disulfide , materials science , sulfur , transmission electron microscopy , oxygen , catalysis , adsorption , density functional theory , molybdenum , carbon fibers , nanoparticle , chemical engineering , nanotechnology , chemistry , computational chemistry , organic chemistry , metallurgy , composite material , composite number , engineering
Forming pits on molybdenum disulfide (MoS 2 ) monolayers is desirable for (opto)electrical, catalytic, and biological applications. Thermal oxidation is a potentially scalable method to generate pits on monolayer MoS 2 , and pits are assumed to preferentially form around undercoordinated sites, such as sulfur vacancies. However, studies on thermal oxidation of MoS 2 monolayers have not considered the effect of adventitious carbon (C) that is ubiquitous and interacts with oxygen at elevated temperatures. Herein, the effect of adventitious C on the pit formation on MoS 2 monolayers during thermal oxidation is studied. The in situ environmental transmission electron microscopy measurements herein show that pit formation is preferentially initiated at the interface between adventitious C nanoparticles and MoS 2 , rather than only sulfur vacancies. Density functional theory (DFT) calculations reveal that the C/MoS 2 interface favors the sequential adsorption of oxygen atoms with facile kinetics. These results illustrate the important role of adventitious C on pit formation on monolayer MoS 2 .