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Fabricating 3D Metastructures by Simultaneous Modulation of Flexible Resist Stencils and Basal Molds
Author(s) -
Cai Hongbing,
Meng Qiushi,
Chen Qiang,
Ding Huaiyi,
Dai Yanmeng,
Li Sijia,
Chen Disheng,
Tan Qinghai,
Pan Nan,
Zeng Changgan,
Qi Zeming,
Liu Gang,
Tian Yangchao,
Gao Weibo,
Wang Xiaoping
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.202002570
Subject(s) - materials science , resist , nanotechnology , metamaterial , lithography , planar , nanostructure , high resolution , photomask , photolithography , optoelectronics , computer science , computer graphics (images) , remote sensing , layer (electronics) , geology
Metamaterials have gained much attention thanks to their extraordinary and intriguing optical properties beyond natural materials. However, universal high‐resolution fabrications of 3D micro/nanometastructures with high‐resolution remain a challenge. Here, a novel approach to fabricate sophisticated 3D micro/nanostructures with excellent robustness and precise controllability is demonstrated by simultaneously modulating of flexible resist stencils and basal molds. This method allows arbitrary manipulations of morphology, size, and orientation, as well as contact angles of the objects. Combined with a new alignment strategy of high‐resolution, previously inaccessible architectures are fabricated with ultrahigh precision, leading to an excellent spectra response from the fabricated metastructures. This method provides a new possibility to realize true 3D metamaterial fabrications featuring high‐resolution and direct‐compatibility with broad planar lithography platforms.