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Perovskite Films with Reduced Interfacial Strains via a Molecular‐Level Flexible Interlayer for Photovoltaic Application
Author(s) -
Zhang CongCong,
Yuan Shuai,
Lou YanHui,
Liu QingWei,
Li Meng,
Okada Hiroyuki,
Wang ZhaoKui
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.202001479
Subject(s) - materials science , ammonium bromide , perovskite (structure) , halide , halogen , chemical engineering , semiconductor , alkyl , inorganic chemistry , pulmonary surfactant , optoelectronics , organic chemistry , chemistry , engineering
Interface strains and lattice distortion are inevitable issues during perovskite crystallization. Silane as a coupling agent is a popular connector to enhance the compatibility between inorganic and organic materials in semiconductor devices. Herein, a protonated amine silane coupling agent (PASCA‐Br) interlayer between TiO 2 and perovskite layers is adopted to directionally grasp both of them by forming the structural component of a lattice unit. The pillowy alkyl ammonium bromide terminals at the upper side of the interlayer provide well‐matched growth sites for the perovskite, leading to mitigated interface strain and ensuing lattice distortion; meanwhile, its superior chemical compatibility presents an ideal effect on healing the under‐coordinated Pb atoms and halogen vacancies of bare perovskite crystals. The PASCA‐Br interlayer also serves as a mechanical buffer layer, inducing less cracked perovskite film when bending. The developed molecular‐level flexible interlayer provides a promising interfacial engineering for perovskite solar cells and their flexible application.