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Scalable Manufacturing of Free‐Standing, Strong Ti 3 C 2 T x MXene Films with Outstanding Conductivity
Author(s) -
Zhang Jizhen,
Kong Na,
Uzun Simge,
Levitt Ariana,
Seyedin Shayan,
Lynch Peter A.,
Qin Si,
Han Meikang,
Yang Wenrong,
Liu Jingquan,
Wang Xungai,
Gogotsi Yury,
Razal Joselito M.
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.202001093
Subject(s) - materials science , electrical resistivity and conductivity , conductivity , fabrication , electrical conductor , electromagnetic shielding , ultimate tensile strength , composite material , nanotechnology , optoelectronics , electrical engineering , medicine , chemistry , alternative medicine , pathology , engineering
Free‐standing films that display high strength and high electrical conductivity are critical for flexible electronics, such as electromagnetic interference (EMI) shielding coatings and current collectors for batteries and supercapacitors. 2D Ti 3 C 2 T x flakes are ideal candidates for making conductive films due to their high strength and metallic conductivity. It is, however, challenging to transfer those outstanding properties of single MXene flakes to macroscale films as a result of the small flake size and relatively poor flake alignment that occurs during solution‐based processing. Here, a scalable method is shown for the fabrication of strong and highly conducting pure MXene films containing highly aligned large MXene flakes. These films demonstrate record tensile strength up to ≈570 MPa for a 940 nm thick film and electrical conductivity of ≈15 100 S cm −1 for a 214 nm thick film, which are both the highest values compared to previously reported pure Ti 3 C 2 T x films. These films also exhibit outstanding EMI shielding performance (≈50 dB for a 940 nm thick film) that exceeds other synthetic materials with comparable thickness. MXene films with aligned flakes provide an effective route for producing large‐area, high‐strength, and high‐electrical‐conductivity MXene‐based films for future electronic applications.

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