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Topological Insulators: Deep‐Subwavelength Holey Acoustic Second‐Order Topological Insulators (Adv. Mater. 49/2019)
Author(s) -
Zhang Zhiwang,
Long Houyou,
Liu Chen,
Shao Chen,
Cheng Ying,
Liu Xiaojun,
Christensen Johan
Publication year - 2019
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201970344
Subject(s) - topological insulator , diffraction , robustness (evolution) , materials science , acoustic metamaterials , topology (electrical circuits) , wavelength , fabrication , optics , acoustic wave , condensed matter physics , physics , optoelectronics , engineering , electrical engineering , medicine , biochemistry , chemistry , alternative medicine , pathology , gene
In article number 1904682, Ying Cheng, Xiaojun Liu, Johan Christensen, and co‐workers propose the marriage of spoof surface acoustic waves and second‐order topological insulators supporting extremely confined corner states 50 times smaller than the wavelength. Besides the topological robustness against fabrication imperfections, a programmable device is designed to achieve acoustic imaging far beyond the diffraction limit.