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Clean Graphene Surfaces: A Force‐Engineered Lint Roller for Superclean Graphene (Adv. Mater. 43/2019)
Author(s) -
Sun Luzhao,
Lin Li,
Wang Zihao,
Rui Dingran,
Yu Zhiwei,
Zhang Jincan,
Li Yanglizhi,
Liu Xiaoting,
Jia Kaicheng,
Wang Kexin,
Zheng Liming,
Deng Bing,
Ma Tianbao,
Kang Ning,
Xu Hongqi,
Novoselov Konstantin S.,
Peng Hailin,
Liu Zhongfan
Publication year - 2019
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201970303
Subject(s) - graphene , materials science , lint , dielectric , nanotechnology , composite material , optoelectronics , computer science , operating system
A new approach to clean the surface of graphene is reported by Hailin Peng, Zhongfan Liu, and co‐workers in article number 1902978, who use a force‐engineered “lint roller” to selectively removing the graphene's intrinsic surface contaminants. The as‐obtained super‐clean graphene can be transferred to dielectric substrates with significantly reduced polymer residues, and it exhibits superior electronic and optical properties such as ultrahigh carrier mobility and low contact resistance.