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Adlayer‐Free Large‐Area Single Crystal Graphene Grown on a Cu(111) Foil
Author(s) -
Luo Da,
Wang Meihui,
Li Yunqing,
Kim Changsik,
Yu Ka Man,
Kim Yohan,
Han Huijun,
Biswal Mandakini,
Huang Ming,
Kwon Youngwoo,
Goo Min,
CamachoMojica Dulce C.,
Shi Haofei,
Yoo Won Jong,
Altman Michael S.,
Shin HyungJoon,
Ruoff Rodney S.
Publication year - 2019
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201903615
Subject(s) - graphene , materials science , crystallite , foil method , chemical vapor deposition , single crystal , annealing (glass) , nanotechnology , graphene oxide paper , graphene nanoribbons , carbon fibers , graphene foam , layer (electronics) , chemical engineering , crystallography , composite material , metallurgy , composite number , chemistry , engineering
To date, thousands of publications have reported chemical vapor deposition growth of “single layer” graphene, but none of them has described truly single layer graphene over large area because a fraction of the area has adlayers. It is found that the amount of subsurface carbon (leading to additional nuclei) in Cu foils directly correlates with the extent of adlayer growth. Annealing in hydrogen gas atmosphere depletes the subsurface carbon in the Cu foil. Adlayer‐free single crystal and polycrystalline single layer graphene films are grown on Cu(111) and polycrystalline Cu foils containing no subsurface carbon, respectively. This single crystal graphene contains parallel, centimeter‐long ≈100 nm wide “folds,” separated by 20 to 50 µm, while folds (and wrinkles) are distributed quasi‐randomly in the polycrystalline graphene film. High‐performance field‐effect transistors are readily fabricated in the large regions between adjacent parallel folds in the adlayer‐free single crystal graphene film.
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