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Controlled Growth of Single‐Crystal Graphene Films
Author(s) -
Zhang Jincan,
Lin Li,
Jia Kaicheng,
Sun Luzhao,
Peng Hailin,
Liu Zhongfan
Publication year - 2020
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201903266
Subject(s) - graphene , nucleation , materials science , grain boundary , chemical vapor deposition , single crystal , nanotechnology , crystal growth , chemical physics , crystallography , composite material , microstructure , thermodynamics , physics , chemistry
Grain boundaries produced during material synthesis affect both the intrinsic properties of materials and their potential for high‐end applications. This effect is commonly observed in graphene film grown using chemical vapor deposition and therefore caused intense interest in controlled growth of grain‐boundary‐free graphene single crystals in the past ten years. The main methods for enlarging graphene domain size and reducing graphene grain boundary density are classified into single‐seed and multiseed approaches, wherein reduction of nucleation density and alignment of nucleation orientation are respectively realized in the nucleation stage. On this basis, detailed synthesis strategies, corresponding mechanisms, and key parameters in the representative methods of these two approaches are separately reviewed, with the aim of providing comprehensive knowledge and a snapshot of the latest status of controlled growth of single‐crystal graphene films. Finally, perspectives on opportunities and challenges in synthesizing large‐area single‐crystal graphene films are discussed.