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Dynamics of Antimonene–Graphene Van Der Waals Growth
Author(s) -
FortinDeschênes Matthieu,
Jacobberger Robert M.,
Deslauriers CharlesAntoine,
Waller Olga,
Bouthillier Étienne,
Arnold Michael S.,
Moutanabbir Oussama
Publication year - 2019
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201900569
Subject(s) - nucleation , heterojunction , materials science , van der waals force , nanotechnology , graphene , nanoscopic scale , chemical physics , epitaxy , atomic units , quantum dot , optoelectronics , physics , layer (electronics) , molecule , quantum mechanics , thermodynamics
Van der Waals (vdW) heterostructures have recently been introduced as versatile building blocks for a variety of novel nanoscale and quantum technologies. Harnessing the unique properties of these heterostructures requires a deep understanding of the involved interfacial interactions and a meticulous control of the growth of 2D materials on weakly interacting surfaces. Although several epitaxial vdW heterostructures have been achieved experimentally, the mechanisms governing their synthesis are still nebulous. With this perspective, herein, the growth dynamics of antimonene on graphene are investigated in real time. In situ low‐energy electron microscopy reveals that nucleation predominantly occurs on 3D nuclei followed by a self‐limiting lateral growth with morphology sensitive to the deposition rate. Large 2D layers are observed at high deposition rates, whereas lower growth rates trigger an increased multilayer nucleation at the edges as they become aligned with the Z2 orientation leading to atoll‐like islands with thicker, well‐defined bands. This complexity of the vdW growth is elucidated based on the interplay between the growth rate, surface diffusion, and edges orientation. This understanding lays the groundwork for a better control of the growth of vdW heterostructures, which is critical to their large‐scale integration.