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Lithography: Perovskite Nanoparticle Composite Films by Size Exclusion Lithography (Adv. Mater. 39/2018)
Author(s) -
Minh Duong Nguyen,
Eom Sangwon,
Nguyen Lan Anh Thi,
Kim Juwon,
Sim Jae Hyun,
Seo Chunhee,
Nam Jihye,
Lee Sangheon,
Suk Soyeon,
Kim Jaeyong,
Kang Youngjong
Publication year - 2018
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201870295
Subject(s) - materials science , lithography , nanoparticle , perovskite (structure) , polymer , nanotechnology , photopolymer , fabrication , composite number , thin film , chemical engineering , optoelectronics , polymerization , composite material , medicine , alternative medicine , pathology , engineering
In article number 1802555 , Youngjong Kang and co‐workers report the fabrication of FAPbX 3 –polymer composite films by utilizing size‐exclusive diffusion of perovskite nanoparticles in photopolymerizing films. Size‐exclusion lithography (SEL) enables high‐resolution patterns of perovskite nanoparticles to be created over a large area during the formation of the polymer films by photopolymerization. The perovskite nanoparticles are excluded by the small mesh size of the polymer networks.