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Reconfigurable Photonic Platforms: A Lithography‐Free and Field‐Programmable Photonic Metacanvas (Adv. Mater. 5/2018)
Author(s) -
Dong Kaichen,
Hong Sukjoon,
Deng Yang,
Ma He,
Li Jiachen,
Wang Xi,
Yeo Junyeob,
Wang Letian,
Lou Shuai,
Tom Kyle B.,
Liu Kai,
You Zheng,
Wei Yang,
Grigoropoulos Costas P.,
Yao Jie,
Wu Junqiao
Publication year - 2018
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201870034
Subject(s) - lithography , photonics , materials science , field (mathematics) , electron beam lithography , photolithography , nanotechnology , maskless lithography , optoelectronics , next generation lithography , laser , power (physics) , optics , resist , physics , mathematics , layer (electronics) , quantum mechanics , pure mathematics
In article number 1703878 , Jie Yao, Junqiao Wu, and co‐workers demonstrate a lithography‐free, rewritable metacanvas, on which nearly arbitrary metaphotonic devices can be rapidly and repeatedly written and erased. The writing is performed with a low‐power laser. The metacanvas opens up possibilities where photonic elements can be field‐programmed to deliver dynamic, complex, and system‐level functionalities.