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Stable Silicene in Graphene/Silicene Van der Waals Heterostructures
Author(s) -
Li Geng,
Zhang Lizhi,
Xu Wenyan,
Pan Jinbo,
Song Shiru,
Zhang Yi,
Zhou Haitao,
Wang Yeliang,
Bao Lihong,
Zhang YuYang,
Du Shixuan,
Ouyang Min,
Pantelides Sokrates T.,
Gao HongJun
Publication year - 2018
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201804650
Subject(s) - silicene , van der waals force , graphene , heterojunction , materials science , density functional theory , nanotechnology , silicon , fabrication , intercalation (chemistry) , condensed matter physics , chemical physics , optoelectronics , computational chemistry , molecule , chemistry , physics , quantum mechanics , medicine , alternative medicine , pathology
Abstract Silicene‐based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I – V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.