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Perovskite Nanoparticle Composite Films by Size Exclusion Lithography
Author(s) -
Minh Duong Nguyen,
Eom Sangwon,
Nguyen Lan Anh Thi,
Kim Juwon,
Sim Jae Hyun,
Seo Chunhee,
Nam Jihye,
Lee Sangheon,
Suk Soyeon,
Kim Jaeyong,
Kang Youngjong
Publication year - 2018
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201802555
Subject(s) - materials science , formamidinium , nanoparticle , composite number , photoluminescence , perovskite (structure) , polymer , nanotechnology , chemical engineering , quantum yield , quantum dot , halide , lithography , optoelectronics , composite material , optics , organic chemistry , chemistry , physics , engineering , fluorescence
Perovskite nanoparticle composite films with capability of high‐resolution patterning (≥2 µm) and excellent resistance to various aqueous and organic solvents are prepared by in situ photosynthesis of acrylate polymers and formamidinium lead halide (FAPbX 3 ) nanoparticles. Both positive‐ and negative‐tone patterns of FAPbX 3 nanoparticles are created by controlling the size exclusive flow of nanoparticles in polymer networks. The position of nanoparticles is spatially controlled in both lateral and vertical directions. The composite films show high photoluminescence quantum yield (up to 44%) and broad color tunability in visible region (λ peak = 465–630 nm).