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Thin‐Film Transistors: Directional Solution Coating by the Chinese Brush: A Facile Approach to Improving Molecular Alignment for High‐Performance Polymer TFTs (Adv. Mater. 34/2017)
Author(s) -
Lin FangJu,
Guo Cheng,
Chuang WeiTsung,
Wang ChienLung,
Wang Qianbin,
Liu Huan,
Hsu ChainShu,
Jiang Lei
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201770248
Subject(s) - materials science , dewetting , brush , thin film transistor , spin coating , wetting , polymer , coating , thin film , solution process , nanotechnology , optoelectronics , composite material , layer (electronics)
Directional solution coating using the Chinese brush provides a facile approach to fabricate highly oriented polymer thin films, by finely controlling the wetting and dewetting process under directional stress, as presented in article number 1606987 by Huan Liu, Chain‐Shu Hsu, and co‐workers. The as‐prepared polymer thin films exhibit over 6 times higher charge‐carrier mobility compared to spin‐coated films, therefore providing a general approach for high‐performance OTFTs.