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Tungsten Disulfide Monolayers: Graphene‐Assisted Antioxidation of Tungsten Disulfide Monolayers: Substrate and Electric‐Field Effect (Adv. Mater. 18/2017)
Author(s) -
Kang Kyungnam,
Godin Kyle,
Kim Young Duck,
Fu Shichen,
Cha Wujoon,
Hone James,
Yang EuiHyeok
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201770125
Subject(s) - tungsten disulfide , graphene , materials science , monolayer , substrate (aquarium) , electric field , heterojunction , tungsten , disulfide bond , molybdenum disulfide , nanotechnology , optoelectronics , chemical engineering , composite material , metallurgy , chemistry , biochemistry , oceanography , physics , quantum mechanics , engineering , geology
The in‐air oxidation of TMDs presents an obstacle in many practical device applications. As described in article number 1603898 by Eui‐Hyeok Yang and co‐workers. WS 2 /graphene heterostructures on a SiO 2 substrate show a very slow oxidation rate, since the graphene layer reduces the effect of surface electric‐fields, resulting in significantly suppressed oxidation of WS 2 /graphene on a SiO 2 substrate. Suspended WS 2 /graphene heterostructures are not oxidized in air, which is attributed to the absence of electric‐fields.