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Photoelectrocatalysis: Spontaneous Electroless Galvanic Cell Deposition of 3D Hierarchical and Interlaced S–M–S Heterostructures (Adv. Mater. 1/2017)
Author(s) -
Tan Chuan Fu,
Azmansah Siti Aishah Bte,
Zhu Hai,
Xu QingHua,
Ho Ghim Wei
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201770001
Subject(s) - materials science , nanorod , galvanic cell , heterojunction , photoluminescence , semiconductor , optoelectronics , nanotechnology , epitaxy , quenching (fluorescence) , chemical engineering , optics , fluorescence , metallurgy , physics , engineering , layer (electronics)
A precise facetted growth of epitaxially interfaced semiconductor–metal–semiconductor (S–M–S) interconnected nanoarray is demonstrated in a novel one‐pot electroless galvanic process, in article 1604417 by G. W. Ho and co‐workers. The quasi‐continuous conductive nanoplates interfaced with photoactive nanorods render a new structural concept, with unified/integrated attributes of photon absorption and trapping with enhanced charge separation and transfer. This results in efficient photoluminescence quenching and emission lifetime reduction for high photoreactivity.