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Monolithic Polymer Nanoridges with Programmable Wetting Transitions
Author(s) -
Lee WonKyu,
Jung WooBin,
Rhee Dongjoon,
Hu Jingtian,
Lee YoungAh Lucy,
Jacobson Christian,
Jung HeeTae,
Odom Teri W.
Publication year - 2018
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201706657
Subject(s) - polyolefin , wetting , materials science , fluoropolymer , composite material , etching (microfabrication) , nanostructure , delamination (geology) , thermoplastic , cracking , nanoscopic scale , plasma etching , polymer , nanotechnology , adhesion , paleontology , layer (electronics) , biology , subduction , tectonics
This paper describes polymeric nanostructures with dynamically tunable wetting properties. Centimeter‐scale areas of monolithic nanoridges can be generated by strain relief of thermoplastic polyolefin films with fluoropolymer skin layers. Changing the amount of strain results in polyolefin ridges with aspect ratios greater than four with controlled feature densities. Surface chemistry and topography are demonstrated to be able to be tailored by SF 6 ‐plasma etching to access multiple wetting states: Wenzel, Cassie–Baxter, and Cassie‐impregnating states. Reversible transitions among the wetting states can be realized in a programmable manner by cyclic stretching and reshrinking the patterned substrates without delamination and cracking.