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Gas Separation: Metal–Organic Covalent Network Chemical Vapor Deposition for Gas Separation (Adv. Mater. 34/2016)
Author(s) -
Boscher Nicolas D.,
Wang Minghui,
Perrotta Alberto,
Heinze Katja,
Creatore Mariadriana,
Gleason Karen K.
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201670240
Subject(s) - chemical vapor deposition , materials science , covalent bond , chemical engineering , gas separation , polymerization , deposition (geology) , trimethylsilyl , metal , nanotechnology , organic chemistry , polymer , composite material , chemistry , biochemistry , membrane , engineering , metallurgy , paleontology , sediment , biology
The chemical vapor deposition polymerization of metalloporphyrin building units provides an easily up‐scalable one‐step method toward the deposition of a new class of dense and defect‐free metal–organic covalent network (MOCN) layers. The resulting hyper‐thin and flexible MOCN layers, supported on poly[1‐(trimethylsilyl)‐1‐propyne], exhibit outstanding gas‐separation performances for multiple gas pairs, as described on page 7479 by K. K. Gleason and co‐workers.