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Flexible Electronics: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells (Adv. Mater. 28/2016)
Author(s) -
He Rongrui,
Day Todd D.,
Sparks Justin R.,
Sullivan Nichole F.,
Badding John V.
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201670195
Subject(s) - materials science , silane , chemical vapor deposition , amorphous silicon , deposition (geology) , silicon , amorphous solid , substrate (aquarium) , chemical engineering , combustion chemical vapor deposition , plasma enhanced chemical vapor deposition , optoelectronics , nanotechnology , thin film , crystalline silicon , composite material , carbon film , organic chemistry , chemistry , paleontology , oceanography , sediment , engineering , biology , geology
On page 5939, J. V. Badding and co‐workers describe the unrolling of a flexible hydrogenated amorphous silicon solar cell, deposited by high‐pressure chemical vapor deposition. The high‐pressure deposition process is represented by the molecules of silane infiltrating the small voids between the rolled up substrate, facilitating plasma‐free deposition over a very large area. The high‐pressure approach is expected to also find application for 3D nanoarchitectures.