Premium
Transistors: Realization of Room‐Temperature Phonon‐Limited Carrier Transport in Monolayer MoS 2 by Dielectric and Carrier Screening (Adv. Mater. 3/2016)
Author(s) -
Yu Zhihao,
Ong ZhunYong,
Pan Yiming,
Cui Yang,
Xin Run,
Shi Yi,
Wang Baigeng,
Wu Yun,
Chen Tangsheng,
Zhang YongWei,
Zhang Gang,
Wang Xinran
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201670019
Subject(s) - monolayer , materials science , dielectric , phonon , electron mobility , substrate (aquarium) , transistor , optoelectronics , impurity , condensed matter physics , nanotechnology , electrical engineering , physics , oceanography , engineering , quantum mechanics , voltage , geology
On page 547, charged impurities in monolayer MoS 2 are effectively screened by combining a high‐κ dielectric substrate and a high density of carriers, leading to an unprecedented room‐temperature electron mobility of ≈150 cm 2 V −1 s −1 . Y. Shi, G. Zhang, X. Wang and co‐workers also demonstrate phonon‐limited transport in monolayer MoS 2 for the first time, an important milestone for electronic device applications.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom