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Significant Radiation Tolerance and Moderate Reduction in Thermal Transport of a Tungsten Nanofilm by Inserting Monolayer Graphene
Author(s) -
Si Shuyao,
Li Wenqing,
Zhao Xiaolong,
Han Meng,
Yue Yanan,
Wu Wei,
Guo Shishang,
Zhang Xingang,
Dai Zhigao,
Wang Xinwei,
Xiao Xiangheng,
Jiang Changzhong
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201604623
Subject(s) - graphene , materials science , tungsten , stacking , reduction (mathematics) , monolayer , irradiation , radiation , radiation tolerance , nanotechnology , thermal , optoelectronics , optics , radiation therapy , physics , geometry , mathematics , nuclear magnetic resonance , meteorology , nuclear physics , metallurgy , medicine
Tungsten–graphene multilayer composites are fabricated using a stacking method. The thermal resistance induced by the graphene interlayer is moderate. An ion‐implantation method is used to verify the radiation tolerance. The results show that graphene inserted among tungsten films plays a dominant role in reducing radiation damage. Furthermore, the performance of different tungsten period‐thicknesses in radiation tolerance is systematically analyzed.