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High‐Mobility Multilayered MoS 2 Flakes with Low Contact Resistance Grown by Chemical Vapor Deposition
Author(s) -
Zheng Jingying,
Yan Xingxu,
Lu Zhixing,
Qiu Hailong,
Xu Guanchen,
Zhou Xu,
Wang Peng,
Pan Xiaoqing,
Liu Kaihui,
Jiao Liying
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201604540
Subject(s) - chemical vapor deposition , materials science , contact resistance , deposition (geology) , nanotechnology , layer (electronics) , paleontology , sediment , biology
The controlled synthesis of high‐quality multilayer (ML) MoS 2 flakes with gradually shrinking basal planes by chemical vapor deposition (CVD) is demonstrated. These CVD‐grown ML MoS 2 flakes exhibit much higher mobility and current density than mechanically exfoliated ML flakes due to the reduced contact resistance which mainly resulted from direct contact between the lower MoS 2 layers and electrodes.
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