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Engineering Surfaces through Sequential Stop‐Flow Photopatterning
Author(s) -
Pester Christian W.,
Narupai Benjaporn,
Mattson Kaila M.,
Bothman David P.,
Klinger Daniel,
Lee Kenneth W.,
Discekici Emre H.,
Hawker Craig J.
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201602900
Subject(s) - photomask , lithography , nanotechnology , materials science , modular design , substrate (aquarium) , computer science , flow chemistry , continuous flow , optoelectronics , engineering , biochemical engineering , oceanography , layer (electronics) , geology , resist , operating system
Solution‐exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet‐printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.