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A Supercritical Lens Optical Label‐Free Microscopy: Sub‐Diffraction Resolution and Ultra‐Long Working Distance
Author(s) -
Qin Fei,
Huang Kun,
Wu Jianfeng,
Teng Jinghua,
Qiu ChengWei,
Hong Minghui
Publication year - 2017
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201602721
Subject(s) - materials science , lens (geology) , generator (circuit theory) , nanotechnology , diffraction , superresolution , laser , resolution (logic) , planar , optics , computer science , computer graphics (images) , artificial intelligence , image (mathematics) , physics , power (physics) , quantum mechanics
A planar metalens for achieving super‐resolution imaging in far‐field is proposed. This metalens, which has a non‐sub‐wavelength feature size, can be fabricated by conventional laser pattern generator. The imaging process is purely physical and captured in real time, without any pre‐ and post‐processing.