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Complex High‐Aspect‐Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self‐Assembly
Author(s) -
Jeon HwanJin,
Kim Ju Young,
Jung WooBin,
Jeong HyeonSu,
Kim Yun Ho,
Shin Dong Ok,
Jeong SeongJun,
Shin Jonghwa,
Kim Sang Ouk,
Jung HeeTae
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201602523
Subject(s) - copolymer , materials science , sputtering , nanotechnology , lithography , nanostructure , block (permutation group theory) , aspect ratio (aeronautics) , thin film , optoelectronics , polymer , composite material , geometry , mathematics
High‐resolution (10 nm), high‐areal density, high‐aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary‐sputtering phenomenon during the Ar‐ion‐bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.