Complex High‐Aspect‐Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self‐Assembly | Zendy

Jeon HwanJin | Zendy; Kim Ju Young | Zendy; Jung WooBin | Zendy; Jeong HyeonSu | Zendy; Kim Yun Ho | Zendy; Shin Dong Ok | Zendy; Jeong SeongJun | Zendy; Shin Jonghwa | Zendy; Kim Sang Ouk | Zendy; Jung HeeTae | Zendy

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Complex High‐Aspect‐Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self‐Assembly

Author(s) -

Jeon HwanJin,

Kim Ju Young,

Jung WooBin,

Jeong HyeonSu,

Kim Yun Ho,

Shin Dong Ok,

Jeong SeongJun,

Shin Jonghwa,

Kim Sang Ouk,

Jung HeeTae

Publication year - 2016

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.201602523

Subject(s) - copolymer , materials science , sputtering , nanotechnology , lithography , nanostructure , block (permutation group theory) , aspect ratio (aeronautics) , thin film , optoelectronics , polymer , composite material , geometry , mathematics

High‐resolution (10 nm), high‐areal density, high‐aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary‐sputtering phenomenon during the Ar‐ion‐bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.

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