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Metal–Organic Covalent Network Chemical Vapor Deposition for Gas Separation
Author(s) -
Boscher Nicolas D.,
Wang Minghui,
Perrotta Alberto,
Heinze Katja,
Creatore Mariadriana,
Gleason Karen K.
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201601010
Subject(s) - chemical vapor deposition , materials science , polymerization , covalent bond , scalability , nanotechnology , gas separation , deposition (geology) , metal , computer science , organic chemistry , polymer , chemistry , database , metallurgy , paleontology , biochemistry , membrane , sediment , composite material , biology
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up‐scalable one‐step method toward the deposition of a new class of dense and defect‐free metal–organic covalent network (MOCN) layers. The resulting hyper‐thin and flexible MOCN layers exhibit outstanding gas‐separation performances for multiple gas pairs.