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Athermal Azobenzene‐Based Nanoimprint Lithography
Author(s) -
Probst Christian,
Meichner Christoph,
Kreger Klaus,
Kador Lothar,
Neuber Christian,
Schmidt HansWerner
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201505552
Subject(s) - azobenzene , nanoimprint lithography , materials science , nanotechnology , resist , lithography , nanolithography , computer science , optoelectronics , polymer , fabrication , medicine , alternative medicine , pathology , layer (electronics) , composite material
A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated.