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Approaching Gas Phase Electrodeposition: Process and Optimization to Enable the Self‐Aligned Growth of 3D Nanobridge‐Based Interconnects
Author(s) -
Fang Jun,
Schlag Leslie,
Park SeChul,
Stauden Thomas,
Pezoldt Jörg,
Schaaf Peter,
Jacobs Heiko O.
Publication year - 2016
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201503039
Subject(s) - materials science , nanowire , nanotechnology , electrode , chemical vapor deposition , deposition (geology) , process (computing) , phase (matter) , optoelectronics , computer science , chemistry , organic chemistry , operating system , paleontology , sediment , biology
A nanowire bonding process referred to as gas‐phase electrodeposition is reported to form nanobridge‐based interconnects. The process is able to grow free‐standing point‐to‐point electrical connections using metallic wires. As a demonstration, programmable interconnects and an interdigitated electrode array are shown. The process is more material efficient when compared with conventional vapor deposition since the material is directed to the point of use.

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