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Wettability Contrast Gravure Printing
Author(s) -
Zhang Heng,
Ramm Alexander,
Lim Sooman,
Xie Wei,
Ahn Bok Yeop,
Xu WeiChao,
Mahajan Ankit,
Suszynski Wieslaw J.,
Kim Chris,
Lewis Jennifer A.,
Frisbie C. Daniel,
Francis Lorraine F.
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201502639
Subject(s) - materials science , inkwell , wetting , aqueous medium , aqueous solution , silicon , nanotechnology , composite material , chemical engineering , metallurgy , organic chemistry , engineering , chemistry
Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.