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Directed Self‐Assembly of Poly(2‐vinylpyridine)‐ b ‐polystyrene‐ b ‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
Author(s) -
Sun Zhiwei,
Chen Zhenbin,
Zhang Wenxu,
Choi Jaewon,
Huang Caili,
Jeong Gajin,
Coughlin E. Bryan,
Hsu Yautzong,
Yang XiaoMin,
Lee Kim Y.,
Kuo David S.,
Xiao Shuaigang,
Russell Thomas P.
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201501585
Subject(s) - materials science , copolymer , polystyrene , photoresist , lamellar structure , polymer chemistry , template , self assembly , chemical engineering , nanotechnology , polymer , composite material , layer (electronics) , engineering
Low molecular weight P2VP‐ b ‐PS‐ b ‐P2VP triblock copolymer (poly(2‐vinlypyridine)‐ block ‐polystyrene‐ block ‐poly(2‐vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt‐doped P2VP‐ b ‐PS‐ b ‐P2VP triblock copolymer is self‐assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long‐range ordering are prepared with platinum‐salt infiltration and plasma etching.