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In Situ Nanolithography with Sub‐10 nm Resolution Realized by Thermally Assisted Spin‐Casting of a Self‐Assembling Polymer
Author(s) -
Lee Jung Hye,
Kim YongJoo,
Cho JoongYeon,
Yang Se Ryeun,
Kim Jong Min,
Yim Soonmin,
Lee Heon,
Jung Yeon Sik
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201501363
Subject(s) - nanolithography , materials science , copolymer , nanoscopic scale , polymer , annealing (glass) , nanotechnology , in situ , casting , fabrication , composite material , organic chemistry , medicine , chemistry , alternative medicine , pathology
In situ nanolithography is realized based on warm spin‐casting of block copolymer solutions. This advancement is based on Si‐containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase‐separation combined with the thermal assistance provided by slight temperature elevations during the spin‐casting. Sub‐10 nm half‐pitch nanoscale patterns are produced within 30 s without a separate annealing process.