z-logo
Premium
Field‐Effect Transistors Based on Amorphous Black Phosphorus Ultrathin Films by Pulsed Laser Deposition
Author(s) -
Yang Zhibin,
Hao Jianhua,
Yuan Shuoguo,
Lin Shenghuang,
Yau Hei Man,
Dai Jiyan,
Lau Shu Ping
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201500990
Subject(s) - materials science , black phosphorus , amorphous solid , pulsed laser deposition , deposition (geology) , nanoscopic scale , optoelectronics , band gap , phosphorus , field effect transistor , thin film transistor , electron mobility , laser , nanotechnology , transistor , thin film , optics , layer (electronics) , metallurgy , electrical engineering , crystallography , paleontology , chemistry , engineering , voltage , sediment , biology , physics
Amorphous black phosphorus (a‐BP) ultrathin films are deposited by pulsed laser deposition. a‐BP field‐effect transistors, exhibiting high carrier mobility and moderate on/off current ratio, are demonstrated. Thickness dependence of the bandgap, mobility, and on/off ratio are observed. These results offer not only a new nanoscale member in the BP family, but also a new opportunity to develop nanoelectronic devices.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom