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Record Charge Carrier Diffusion Length in Colloidal Quantum Dot Solids via Mutual Dot‐To‐Dot Surface Passivation
Author(s) -
Carey Graham H.,
Levina Larissa,
Comin Riccardo,
Voznyy Oleksandr,
Sargent Edward H.
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201405782
Subject(s) - quantum dot , passivation , materials science , diffusion , colloid , nanotechnology , nanocrystal , optoelectronics , physics , chemistry , layer (electronics) , thermodynamics
Through a combination of chemical and mutual dot‐to‐dot surface passivation , high‐quality colloidal quantum dot solids are fabricated. The joint passivation techniques lead to a record diffusion length for colloidal quantum dots of 230 ± 20 nm. The technique is applied to create thick photovoltaic devices that exhibit high current density without losing fill factor.