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Microcontact‐Printing‐Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application
Author(s) -
Liu Jian,
Wang Hongqiang,
Chen Zu Peng,
Moehwald Helmuth,
Fiechter Sebastian,
van de Krol Roel,
Wen Liping,
Jiang Lei,
Antonietti Markus
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201404543
Subject(s) - materials science , carbon nitride , nanotechnology , photocurrent , nitride , carbon fibers , substrate (aquarium) , photoelectrochemistry , chemical vapor deposition , optoelectronics , layer (electronics) , composite material , electrode , photocatalysis , electrochemistry , chemistry , geology , composite number , catalysis , biochemistry , oceanography
An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm –2 at 1.23 V RHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices.