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Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films
Author(s) -
Aissou Karim,
Mumtaz Muhammad,
Fleury Guillaume,
Portale Giuseppe,
Navarro Christophe,
Cloutet Eric,
Brochon Cyril,
Ross Caroline A.,
Hadziioannou Georges
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201404077
Subject(s) - materials science , copolymer , lithography , crystallinity , thin film , annealing (glass) , polymer , self assembly , methacrylate , methyl methacrylate , chemical engineering , polymer chemistry , nanotechnology , composite material , optoelectronics , engineering
Highly‐ordered arrays with sub‐10 nm features are produced with topographical‐directed self‐assembly of low‐molecular‐weight poly(1,1‐dimethyl silacyclobutane)‐ block ‐poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.