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Perovskite Thin Films via Atomic Layer Deposition
Author(s) -
Sutherland Brandon R.,
Hoogland Sjoerd,
Adachi Michael M.,
Kanjanaboos Pongsakorn,
Wong Chris T. O.,
McDowell Jeffrey J.,
Xu Jixian,
Voznyy Oleksandr,
Ning Zhijun,
Houtepen Arjan J.,
Sargent Edward H.
Publication year - 2015
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201403965
Subject(s) - atomic layer deposition , materials science , perovskite (structure) , layer (electronics) , thin film , deposition (geology) , layer by layer , nanotechnology , chemical engineering , atomic layer epitaxy , optoelectronics , paleontology , sediment , engineering , biology
A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place‐exchanged with PbI 2 and subsequently CH 3 NH 3 PbI 3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm −1 .