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In Situ Controlled Growth of Titanium Nitride in Amorphous Silicon Nitride: A General Route Toward Bulk Nitride Nanocomposites with Very High Hardness
Author(s) -
Bechelany Mirna Chaker,
Proust Vanessa,
Gervais Christel,
Ghisleni Rudy,
Bernard Samuel,
Miele Philippe
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201402356
Subject(s) - materials science , nanocomposite , tin , amorphous solid , titanium nitride , nitride , nanocrystal , silicon nitride , chemical engineering , composite material , nanotechnology , metallurgy , silicon , crystallography , layer (electronics) , chemistry , engineering
Bulk nanocomposites possessing very high hardness in which TiN nanocrystallites are homogeneously embedded in an amorphous Si 3 N 4 matrix are produced from perhydropolysilazane and tetrakisdimethylaminotitanium. That is, a low‐molecular‐weight TiN molecule is mixed in controlled molar ratio with a polymeric Si 3 N 4 precursor; further processing, including ammonolysis, warm pressing, and controlled nanocrystal growth, yields nanocomposites with the desired properties.