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Element Specific Monolayer Depth Profiling
Author(s) -
Macke Sebastian,
Radi Abdullah,
HamannBorrero Jorge E.,
Verna Adriano,
Bluschke Martin,
Brück Sebastian,
Goering Eberhard,
Sutarto Ronny,
He Feizhou,
Cristiani Georg,
Wu Meng,
Benckiser Eva,
Habermeier HannsUlrich,
Logvenov Gennady,
Gauquelin Nicolas,
Botton Gianluigi A.,
Kajdos Adam P.,
Stemmer Susanne,
Sawatzky George A.,
Haverkort Maurits W.,
Keimer Bernhard,
Hinkov Vladimir
Publication year - 2014
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.201402028
Subject(s) - materials science , nanometre , stoichiometry , monolayer , profiling (computer programming) , analytical chemistry (journal) , nanotechnology , composite material , chemistry , chromatography , computer science , operating system
The electronic phase behavior and functionality of interfaces and surfaces in complex materials are strongly correlated to chemical composition profiles, stoichiometry and intermixing. Here a novel analysis scheme for resonant X‐ray reflectivity maps is introduced to determine such profiles, which is element specific and non‐destructive, and which exhibits atomic‐layer resolution and a probing depth of hundreds of nanometers.